The post-doctoral research station of China Silicon Corporation Ltd. (SINOSICO) was approved by the Ministry of Human Resources and Social Security and the National Administrative Committee of Postdoctoral Researchers in September 2013 and officially established on February 26, 2014. The station mainly focuses on polysilicon and other silicon material products and their technologies, accelerates scientific and technological innovation, catches up with the international advanced level, and carries out research on core key technologies and forward-looking technology projects such as high-purity polysilicon, silicon-based electronic special gas, silicon wafers, battery materials. Some returned scientific and technical talent have also conducted in-depth and detailed communication and environmental inspections on the station. The station has strengthened the introduction of postdoctoral talents through multiple channels and methods. At present, many doctors have successfully completed the exit procedures here. In the future, it will continue to strengthen cooperation with universities, scientific research institutes and enterprises, attract, gather and cultivate higher-level talents in polysilicon and related research fields, accelerate the transformation and application of scientific and technological achievements, promote the upgrading of enterprise product structure and enhance core competitiveness.